Company Filing History:
Years Active: 2017-2025
Title: The Innovative Contributions of Serge Kosche
Introduction
Serge Kosche is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of substrate processing systems, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing technologies.
Latest Patents
One of Serge Kosche's latest patents is a substrate processing system that includes a dual ion filter for downstream plasma. This innovative system features a dual ion filter arranged between upper and lower chambers. The upper filter is designed with a first plurality of through holes that filter ions from the plasma in the upper chamber. In contrast, the lower filter includes a second plurality of through holes that control plasma uniformity in the lower chamber. Notably, the diameter of the first plurality of through holes is less than that of the second plurality, and the number of holes in the upper filter exceeds that in the lower filter. Another patent involves a substrate processing system that comprises an upper chamber and a gas delivery system to supply a gas mixture. An RF generator generates plasma in the upper chamber, while a dual ion filter is positioned between the upper and lower chambers to enhance processing efficiency.
Career Highlights
Serge Kosche is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop cutting-edge technologies that are crucial for modern manufacturing processes.
Collaborations
Throughout his career, Serge has collaborated with talented individuals such as Andrew Stratton Bravo and Chih-Hsun Hsu. These collaborations have contributed to the advancement of innovative solutions in substrate processing.
Conclusion
Serge Kosche's contributions to the field of substrate processing systems demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of plasma technology and its applications in the semiconductor industry.