The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Sep. 12, 2017
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Dengliang Yang, Union City, CA (US);

Ilia Kalinovski, Berkeley, CA (US);

Haoquan Fang, Sunnyvale, CA (US);

David Cheung, Foster City, CA (US);

Assignee:

LAM RESEARCH CORPORATION, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/27 (2006.01); G01J 3/443 (2006.01); G01N 21/62 (2006.01); G01N 21/68 (2006.01);
U.S. Cl.
CPC ...
G01N 21/27 (2013.01); G01J 3/443 (2013.01); G01N 21/62 (2013.01); G01N 21/68 (2013.01); G01N 2021/625 (2013.01); G01N 2201/061 (2013.01);
Abstract

A measurement system to measure a concentration of neutral gas species above a substrate includes a substrate support located in a chamber to support a substrate. A plasma source generates plasma in the chamber above the substrate. The plasma generates metastable species having higher ionization energy than a neutral gas species. The metastable species excite the neutral gas species located above the substrate. An optical emission spectrometer (OES) sensor measures spectra from a location above the substrate while the plasma is generated by the plasma source. A controller is configured to determine a concentration of the neutral gas species in a region above the substrate based on the measured spectra and to selectively process the substrate based on the concentration.


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