Pleasanton, CA, United States of America

Daniel O Clark

This inventor holds 38 USPTO granted patents and 10 published patent applications and 1 EPO patent, primarily in Manufacturing Processes. Top assignees: Applied Materials, Inc., The Dow Chemical Company, Advanced Technology Materials, Inc.. Active years: 1986-2021.

USPTO Granted Patents = 38 

% Patents Active = 73.7

 

Average Co-Inventor Count = 3.9

ph-index = 15

Forward Citations = 859(Granted Patents)


Location History:

  • Benicia, CA (US) (1986 - 1990)
  • Benica, CA (US) (1993)
  • Pleasanton, CA (US) (1996 - 2021)

Company Filing History:


Years Active: 1986-2021

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Areas of Expertise:
Exhaust Gas Treatment
Electronic Device Manufacturing
Abatement Technologies
Gas Emissions Monitoring
Reactor Design
Chemical-Mechanical Polishing
Semiconductor Substrates
Fluid Separation Membranes
Hollow Fiber Membranes
Pollutant Abatement
Energy Conservation
Integrated Control Solutions
38 patents (USPTO):Explore Patents

Title: Daniel O Clark: Innovations in Electronic Device Manufacturing

Introduction:

In the world of electronic device manufacturing, one name stands out - Daniel O Clark. With an impressive portfolio of 38 patents and a significant contribution to the field, Clark has played a crucial role in advancing the industry. Based in Pleasanton, CA, Daniel O Clark has worked with renowned companies such as Applied Materials, Inc and Applied Materials GmbH, leaving a lasting impact on electronic device manufacturing technologies.

Patent Highlights:

Among his notable patents, one that stands out is the "Apparatus for treating exhaust gas in a processing system." This invention addresses the challenge of treating exhaust gas in the foreline of substrate processing systems. By flowing the exhaust gas into a plasma source, injecting a reagent, forming a plasma, and introducing a cleaning gas, this patent offers an innovative solution for efficient exhaust gas treatment.

Another significant patent by Daniel O Clark is "Methods and apparatus for conserving electronic device manufacturing resources." This invention outlines a method for operating an electronic device manufacturing system, where an inert gas is introduced into the process tool vacuum pump at different flow rates depending on the process mode. This approach allows for resource conservation while improving system efficiency.

Professional Contributions:

Throughout his career, Daniel O Clark has collaborated with accomplished individuals in the field. His noteworthy coworkers such as Shaun W Crawford and Jay J Jung have likely influenced his achievements. Their collective expertise has contributed to the success and advancement of electronic device manufacturing technologies.

Company Experience:

Clark's association with Applied Materials, Inc and Applied Materials GmbH solidifies his expertise in the industry. Applied Materials, Inc, a global leader in materials engineering solutions, has continuously pushed the boundaries of innovation for over five decades. Collaborating with such influential companies signifies Daniel O Clark's involvement in cutting-edge research and development.

Conclusion:

Daniel O Clark's tenure in the electronic device manufacturing industry has been marked by exemplary contributions, demonstrated by his extensive patent portfolio. By working on groundbreaking technologies and collaborating with industry leaders, Clark has aided in the advancement of the field. His patents, including those related to exhaust gas treatment and resource conservation, have left a significant impact on the industry, ensuring more sustainable and efficient manufacturing processes for electronic devices.

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