The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2013

Filed:

May. 25, 2008
Applicants:

Phil Chandler, San Francisco, CA (US);

Daniel O. Clark, Pleasanton, CA (US);

Robbert M. Vermeulen, Pleasant Hill, CA (US);

Jay J. Jung, Sunnyvale, CA (US);

Roger M. Johnson, Fremont, CA (US);

Youssef A. Loldj, Sunnyvale, CA (US);

James L. Smith, Chandler, AZ (US);

Inventors:

Phil Chandler, San Francisco, CA (US);

Daniel O. Clark, Pleasanton, CA (US);

Robbert M. Vermeulen, Pleasant Hill, CA (US);

Jay J. Jung, Sunnyvale, CA (US);

Roger M. Johnson, Fremont, CA (US);

Youssef A. Loldj, Sunnyvale, CA (US);

James L. Smith, Chandler, AZ (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.


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