Livermore, CA, United States of America

Roger M Johnson


 

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 67(Granted Patents)


Location History:

  • Fremont, CA (US) (2013)
  • Livermore, CA (US) (2016 - 2024)

Company Filing History:


Years Active: 2013-2024

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: The Innovative Contributions of Roger M. Johnson

Introduction

Roger M. Johnson, an accomplished inventor based in Livermore, California, has made significant strides in the field of chemical mechanical polishing (CMP). With a remarkable portfolio of 13 patents, Johnson's work has contributed to advancements in substrate polishing technology, particularly in the semiconductor industry.

Latest Patents

Two of Johnson's latest patents exemplify his innovative mindset and technical expertise. The first is a "Chemical Mechanical Polishing System with Platen Temperature Control," which details a polishing system designed to enhance performance by incorporating a platen temperature control system. This system features a PID controller, fluid controller, and heat exchanger, all working harmoniously to regulate the temperature for optimal polishing results.

His second recent patent, titled "Sequential Application of Cleaning Fluids for Improved Maintenance of Chemical Mechanical Polishing Systems," outlines a method for efficiently maintaining CMP systems. This innovative approach involves the sequential transfer of substrates among multiple polishing stations while utilizing different cleaning fluids to enhance the cleaning efficacy of the polishing surfaces.

Career Highlights

Johnson's career is enriched by his role at Applied Materials, Inc., a leader in the manufacturing of equipment for the semiconductor industry. His technical contributions and innovations have not only propelled the company's advancements but have also set industry standards for CMP processes. His expertise in the field has positioned him as a key figure at Applied Materials, driving forward innovative solutions for substrate polishing.

Collaborations

Throughout his career, Johnson has collaborated with notable individuals such as Brian T. West and Michael Santiago Cox. These partnerships have led to fruitful exchanges of ideas and collective efforts toward developing cutting-edge technologies in the field of chemical mechanical polishing.

Conclusion

Roger M. Johnson's contributions to the world of chemical mechanical polishing through his inventive spirit and collaborative efforts have solidified his standing as a notable inventor. With a continuous focus on innovation, he remains a vital player in shaping the future of substrate polishing technologies, leaving a lasting impact on the industry.

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