The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Jun. 03, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Colin John Dickinson, San Jose, CA (US);

Mehran Moalem, Cupertino, CA (US);

Daniel O. Clark, Pleasanton, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/32 (2006.01); B01D 53/92 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
B01D 53/32 (2013.01); B01D 53/92 (2013.01); C23C 16/4412 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/122 (2013.01); B01D 2259/80 (2013.01); B01D 2259/818 (2013.01);
Abstract

Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas from a process chamber into a plasma source via a foreline; injecting a reagent into the foreline; forming a plasma in the plasma source from the exhaust gas and the reagent; and injecting a cleaning gas into the foreline, wherein the cleaning gas and the reagent are different gases.


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