Fremont, CA, United States of America

Daemian Raj Benjamin Raj

This inventor holds 20 USPTO granted patents and 15 published patent applications, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daemian Raj Benjamin Raj. Retrieved from https://idiyas.com/inventor/daemian-raj-benjamin-raj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 95.0

Average Co-Inventor Count = 6.9

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2021-2026

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Areas of Expertise:
Gas Distribution
Flow Control
RF Parameters
Semiconductor Processing
Multi-Directional Mixing
Chamber Exhaust
Thermal Stability
Edge Plasma Modulation
Curved Faceplate
High Temperature Chucking
Film Stacks
Residue Management
20 patents (USPTO):Explore Patents

Title: **Daemian Raj Benjamin Raj: Innovator in Semiconductor Technology**

Introduction

Daemian Raj Benjamin Raj is a prolific inventor based in Fremont, CA, with a remarkable portfolio of 16 patents to his name. His innovations primarily focus on advancements in semiconductor processing technology. Daemian's contributions have significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest inventions, Daemian has developed two notable patents. The first is the **Shaped Showerhead for Edge Plasma Modulation**, which describes a semiconductor processing chamber consisting of a chamber body, a substrate support, and a showerhead. This design optimizes the processing region within the chamber, enhancing the performance of semiconductor fabrication. The showerhead features multiple apertures and a unique bottom surface designed to improve gas distribution and plasma modulation.

The second patent is the **Modular Multi-Directional Gas Mixing Block**. This innovative gas block comprises a body with both inlet and outlet ends, defining two distinct gas paths. It enhances the flexibility and efficiency of gas mixing in semiconductor processes, allowing manufacturers to achieve precise control over the gas flow, which is critical for producing high-quality semiconductor devices.

Career Highlights

Daemian is currently employed at Applied Materials, Inc., a leading company in the field of semiconductor equipment and technology. His role involves developing cutting-edge solutions that meet the evolving needs of the semiconductor industry. With his extensive knowledge and experience, Daemian has become a key player in advancing technologies that drive innovation in the field.

Collaborations

Throughout his career, Daemian has collaborated with notable colleagues, including Shailendra Srivastava and Nikhil Sudhindrarao Jorapur. Together, they have worked on various projects aimed at pushing the boundaries of semiconductor processing, fostering an environment of creativity and ingenuity within their team.

Conclusion

Daemian Raj Benjamin Raj exemplifies the spirit of innovation in the semiconductor industry. With his impressive array of patents and collaborations, he continues to make significant contributions that enhance semiconductor processing technologies. His work not only benefits Applied Materials, Inc. but also plays a crucial role in the advancement of the overall technology landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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