The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
May. 15, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Zaoyuan Ge, San Jose, CA (US);
Manjunath Veerappa Chobari Patil, Karnataka, IN;
Prodosh Kumar Halder, Kolkata, IN;
Prasath Poomani, Tamilnadu, IN;
Badri N. Ramamurthi, Los Gatos, CA (US);
Sungwon Ha, Palo Alto, CA (US);
Daemian Raj Benjamin Raj, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Semiconductor processing chambers and systems, as well as methods of cleaning such chambers and systems are provided. Processing chambers and systems include a chamber body that defines a processing region. Processing chambers and systems include an enhancement liner positioned within the chamber body that includes an interior portion, an exterior portion, and a plurality of apertures. The enhancement liner defines a liner volume between the interior portion and the exterior portion, and a distribution gap is defined between the enhancement liner and a sidewall of the chamber body. Processing chambers and systems include a faceplate disposed vertically above the enhancement liner. Processing chambers and systems include a cleaning gas source coupled with distribution gap through an inlet in the sidewall of the chamber body.