Prodosh Kumar Halder

Title: Prodosh Kumar Halder and Semiconductor Chamber Innovation.

Introduction

Prodosh Kumar Halder is an inventor based in Kolkata, India, associated with Applied Materials, Inc. His patent work concerns semiconductor processing equipment and chamber-cleaning methods. The supplied information lists 1 patent for him.

Latest Patents

“Chamber with Enhancement Liner and Methods for Downstream Residue Management” describes semiconductor processing chambers and systems designed to support chamber cleaning and residue management. The chamber includes a body defining a processing region and an enhancement liner positioned inside it. The liner has interior and exterior portions, multiple apertures, and a volume between those portions, while a distribution gap separates the liner from the chamber sidewall. A faceplate sits above the liner, and a cleaning-gas source connects to the distribution gap through an inlet in the sidewall.

Career Highlights

Halder’s listed patent reflects work on semiconductor chamber design, cleaning-gas distribution, and downstream residue management. His company affiliation is Applied Materials, Inc.

Collaborations

Zaoyuan Ge is identified as Halder’s coworker. The supplied information does not specify their particular collaboration or respective contributions to the patent.

Conclusion

Prodosh Kumar Halder’s listed invention addresses semiconductor chamber architecture and cleaning, with an enhancement liner and gas-distribution arrangement intended to support residue management.