The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2023
Filed:
Dec. 16, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Shailendra Srivastava, Fremont, CA (US);
Sai Susmita Addepalli, San Jose, CA (US);
Nikhil Sudhindrarao Jorapur, Sunnyvale, CA (US);
Daemian Raj Benjamin Raj, Fremont, CA (US);
Amit Kumar Bansal, Milpitas, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Gregory Eugene Chichkanoff, Mountain View, CA (US);
Xinhai Han, Santa Clara, CA (US);
Masaki Ogata, San Jose, CA (US);
Kristopher Enslow, San Jose, CA (US);
Wenjiao Wang, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A faceplate for a substrate process chamber comprises a first and second surface. The second surface is shaped such that the second surface includes a peak and a distance between the first and second surface varies across the width of the faceplate. The second surface of the faceplate is exposed to a processing volume of the process chamber. Further, the faceplate may be part of a lid assembly for the process chamber. The lid assembly may include a blocker plate facing the first surface of the faceplate. A distance between the blocker plate and the first surface is constant.