The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Jul. 09, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Saketh Pemmasani, Hyderabad, IN;
Daemian Raj Benjamin Raj, Fremont, CA (US);
Xiaopu Li, San Jose, CA (US);
Akshay Dhanakshirur, Hubli, IN;
Mayur Govind Kulkarni, Bangalore, IN;
Madhu Santosh Kumar Mutyala, Santa Clara, CA (US);
Deenesh Padhi, Sunnyvale, CA (US);
Hang Yu, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a substrate support disposed within the chamber body. The substrate support may define a substrate support surface. The chambers may include a showerhead positioned supported atop the chamber body. The substrate support and a bottom surface of the showerhead may at least partially define a processing region within the semiconductor processing chamber. The showerhead may define a plurality of apertures through the showerhead. The bottom surface of the showerhead may define an annular groove or ridge that is positioned directly above at least a portion of the substrate support.