The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Aug. 19, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Zheng John Ye, Santa Clara, CA (US);
Daemian Raj Benjamin Raj, Fremont, CA (US);
Shailendra Srivastava, Fremont, CA (US);
Nikhil Sudhindrarao Jorapur, Sunnyvale, CA (US);
Ndanka O. Mukuti, Santa Clara, CA (US);
Dmitry A. Dzilno, Sunnyvale, CA (US);
Juan Carlos Rocha, San Carlos, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/46 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/32128 (2013.01); H01J 37/32165 (2013.01); H01J 37/32183 (2013.01);
Abstract
A method and apparatus for controlling RF plasma attributes is disclosed. Some embodiments of the disclosure provide RF sensors within processing chambers operable at high temperatures. Some embodiments provide methods of measuring RF plasma attributes using RF sensors within a processing chamber to provide feedback control for an RF generator.