Ithaca, NY, United States of America

Christopher Kemper Ober

USPTO Granted Patents = 45 

 

Average Co-Inventor Count = 3.2

ph-index = 12

Forward Citations = 435(Granted Patents)


Company Filing History:

goldMedal27 out of 1,521 
 
Cornell Research Foundation Inc.
 patents
silverMedal14 out of 1,360 
 
Cornell University
 patents
bronzeMedal2 out of 8,369 
 
Massachusetts Institute of Technology
 patents
41 out of 2 
 
University of Wisconsin-madison
 patents
51 out of 377 
 
Japan Synthetic Rubber Co., Ltd.
 patents
61 out of 24,189 
 
Xerox Corporation
 patents
71 out of 278 
 
Loctite Corporation
 patents
81 out of 310 
 
Health Research, Inc.
 patents
91 out of 4 
 
Semiconductor Research Corporation
 patents
101 out of 54,664 
 
Intel Corporation
 patents
111 out of 164,108 
 
International Business Machines Corporation
 patents
121 out of 15,586 
 
Honeywell International Inc.
 patents
131 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
141 out of 39 
 
Kraton Polymers LLC
 patents
151 out of 1,057 
 
Jsr Corporation
 patents
161 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents
171 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1988-2025

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45 patents (USPTO):

Title: Innovator Spotlight: Christopher Kemper Ober

Introduction:

In the realm of semiconductor device fabrication, Christopher Kemper Ober has made significant contributions through his inventive concepts and patented technologies. With a vast portfolio of 30 patents and a career spanning multiple prestigious companies, including Samsung Electronics Co., Ltd. and Cornell University, Ober has relentlessly pursued advancements in metal etchant compositions and radiation-sensitive compositions. This article delves into his latest patents, his notable coworkers, and highlights his impactful work in the field.

Metal Etchant Compositions and Methods of Fabricating a Semiconductor Device:

One of Christopher Kemper Ober's recent patents focuses on metal etchant compositions and the methods employed to fabricate semiconductor devices. The composition itself comprises an organic peroxide (ranging from 0.1 wt % to 20 wt %), an organic acid (ranging from 0.1 wt % to 70 wt %), and an alcohol-based solvent (ranging from 10 wt % to 99.8 wt %). Uniquely, this metal etchant composition can be used in an anhydrous system, presenting notable advantages in semiconductor manufacturing processes.

Radiation-Sensitive Composition and Pattern-Forming Method:

In another significant patent, Ober introduces a radiation-sensitive composition that includes particles comprising a metal oxide as the principal component, accompanied by an organic solvent. The composition incorporates first metal atoms, such as zinc, boron, aluminum, gallium, thallium, germanium, antimony, bismuth, tellurium, or a combination thereof. Of particular importance is the fact that the first metal atom content constitutes no less than 50 atomic % of the total metal atoms in the radiation-sensitive composition. This patent also encompasses a pattern-forming method that involves applying the radiation-sensitive composition to form a film, exposing the film, and developing the exposed film.

Collaborators and Affiliations:

Throughout his career, Christopher Kemper Ober has had the privilege to work alongside talented individuals, such as Jin-kyun Lee and George Malliaras. Their collective expertise and collaborative efforts have undoubtedly enriched the research and development of innovative technologies within the semiconductor field.

Conclusion:

Christopher Kemper Ober's groundbreaking patents in metal etchant compositions and radiation-sensitive compositions exemplify his dedication to advancing semiconductor device fabrication. Guided by his extensive knowledge and experience, Ober's contributions have propelled progress in the industry, with applications extending beyond theory to practical implementations. As he continues to explore new frontiers at the intersection of materials science and semiconductor technology, we eagerly anticipate the next wave of innovations from this remarkable inventor.

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