The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Oct. 20, 2010
Applicants:
Christopher Ober, Ithaca, NY (US);
George Malliaras, Batiment Aramis I, FR;
Jin-kyun Lee, Incheon, KR;
Hon Hang Fong, Ithaca, NY (US);
Inventors:
Christopher Ober, Ithaca, NY (US);
George Malliaras, Batiment Aramis I, FR;
Jin-Kyun Lee, Incheon, KR;
Hon Hang Fong, Ithaca, NY (US);
Assignee:
Cornell University, Ithaca, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods and compositions for obtaining patterned structures comprising fluorine-containing polymeric materials. The fluorine-containing polymeric materials have sufficient fluorine content such that the materials can be patterned using conventional photolithographic/pattern transfer methods and maintain desirable mechanical and physical properties. The patterned structures can be used, for example, in light-emitting devices.