The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Mar. 19, 2012
Applicants:
Evan L. Schwartz, Vadnais Heights, MN (US);
Wei Min Chan, Ithaca, NY (US);
Jin-kyun Lee, Incheon, KR;
Sandip Tiwari, Ithaca, NY (US);
Christopher K. Ober, Ithaca, NY (US);
Inventors:
Evan L. Schwartz, Vadnais Heights, MN (US);
Wei Min Chan, Ithaca, NY (US);
Jin-Kyun Lee, Incheon, KR;
Sandip Tiwari, Ithaca, NY (US);
Christopher K. Ober, Ithaca, NY (US);
Assignee:
Cornell University, Ithaca, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01); B81C 1/00 (2006.01); G03F 7/038 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/16 (2013.01); B81C 1/00031 (2013.01); G03F 7/038 (2013.01); H01L 21/027 (2013.01); B81C 2201/0149 (2013.01); G03F 7/0002 (2013.01); Y10T 428/24851 (2015.01);
Abstract
A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.