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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9389511 B1

PDFFull Text
Date of Patent:
Jul. 12, 2016

Filed:

Mar. 19, 2012

Methods of making patterned structures of materials, patterned structures of materials, and methods of using same

Applicants:

Evan L. Schwartz, Vadnais Heights, MN (US);

Wei Min Chan, Ithaca, NY (US);

Jin-kyun Lee, Incheon, KR;

Sandip Tiwari, Ithaca, NY (US);

Christopher K. Ober, Ithaca, NY (US);

Inventors:

Evan L. Schwartz, Vadnais Heights, MN (US);

Wei Min Chan, Ithaca, NY (US);

Jin-Kyun Lee, Incheon, KR;

Sandip Tiwari, Ithaca, NY (US);

Christopher K. Ober, Ithaca, NY (US);

Assignee:

Cornell University, Ithaca, NY (US);

Attorney:

Hodgson Russ LLP

Primary Examiner:

Kathleen Duda

Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01); B81C 1/00 (2006.01); G03F 7/038 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/16 (2013.01); B81C 1/00031 (2013.01); G03F 7/038 (2013.01); H01L 21/027 (2013.01); B81C 2201/0149 (2013.01); G03F 7/0002 (2013.01); Y10T 428/24851 (2015.01);
Abstract

A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.

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Schwartz, Evan. (2016). Methods of making patterned structures of materials, patterned structures of materials, and methods of using same (U.S. Patent No. 9389511). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9389511

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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