The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Feb. 17, 2017
Jsr Corporation, Tokyo, JP;
Cornell University, Ithaca, NY (US);
Kazuki Kasahara, Tokyo, JP;
Vasiliki Kosma, Ithaca, NY (US);
Jeremy Odent, Ithaca, NY (US);
Hong Xu, Ithaca, NY (US);
Mufei Yu, Ithaca, NY (US);
Emmanuel P. Giannelis, Ithaca, NY (US);
Christopher K. Ober, Ithaca, NY (US);
JSR CORPORATION, Tokyo, JP;
Cornell University, Ithaca, NY (US);
Abstract
A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.