Hong Xu

Title: The Innovations of Hong Xu

Introduction

Hong Xu is an accomplished inventor based in Ithaca, NY. He has made significant contributions to the field of materials science, particularly through his innovative patent related to radiation-sensitive compositions. His work has implications for various applications in technology and manufacturing.

Latest Patents

Hong Xu holds a patent for a radiation-sensitive composition and pattern-forming method. This composition includes particles with a metal oxide as a principal component, combined with an organic solvent. The metal oxide contains a first metal atom, which can be a zinc atom, boron atom, aluminum atom, gallium atom, thallium atom, germanium atom, antimony atom, bismuth atom, tellurium atom, or a combination thereof. Notably, the percentage content of the first metal atom in the composition is no less than 50 atomic percent. The pattern-forming method involves applying this composition to create a film on a substrate, exposing the film, and subsequently developing the exposed film.

Career Highlights

Throughout his career, Hong Xu has worked with notable organizations such as JSR Corporation and Cornell University. His experience in these institutions has allowed him to refine his expertise and contribute to groundbreaking research in his field.

Collaborations

Hong Xu has collaborated with talented individuals, including Kazuki Kasahara and Vasiliki Kosma. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hong Xu's contributions to the field of materials science through his patent and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and manufacturing processes.