Mufei Yu

Title: Mufei Yu: Innovator in Radiation-Sensitive Compositions

Introduction

Mufei Yu is a notable inventor based in Ithaca, NY (US). He has made significant contributions to the field of radiation-sensitive compositions, which are essential in various technological applications. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Mufei Yu holds a patent for a "Radiation-sensitive composition and pattern-forming method." This invention includes a radiation-sensitive composition that comprises particles with a metal oxide as a principal component, combined with an organic solvent. The metal oxide features a first metal atom, which can be a zinc atom, boron atom, aluminum atom, gallium atom, thallium atom, germanium atom, antimony atom, bismuth atom, tellurium atom, or a combination thereof. Notably, the percentage content of the first metal atom in the composition is no less than 50 atomic %. The pattern-forming method involves applying this composition to create a film on a substrate, exposing the film, and subsequently developing the exposed film.

Career Highlights

Throughout his career, Mufei Yu has worked with prominent organizations, including JSR Corporation and Cornell University. His experiences in these institutions have allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

Mufei Yu has collaborated with talented individuals such as Kazuki Kasahara and Vasiliki Kosma. These partnerships have fostered an environment of innovation and creativity, leading to advancements in radiation-sensitive technologies.

Conclusion

Mufei Yu is a distinguished inventor whose work in radiation-sensitive compositions has made a significant impact in the field. His patent and collaborations reflect his dedication to innovation and excellence.