Cornell University

Massachusetts Institute of Technology

Other

International Business Machines Corporation

Samsung Electronics Co., Ltd.

Intel Corporation

Xerox Corporation

Honeywell International Inc.

Wisconsin Alumni Research Foundation

Hitachi Chemical Company, Ltd.

Jsr Corporation

Japan Synthetic Rubber Co., Ltd.

Health Research, Inc.

Loctite Corporation

Kraton Polymers LLC

Christopher Kemper Ober

Jin-kyun Lee

George Malliaras

Qin Lin

Sitaraman Krishnan

Jianguo Wang

Edward J Kramer

Ramakrishnan Ayothi

Alexander Zakhidov

Yi Yi

Hilmar Koerner

Margarita Chatzichristidi

George G Barclay

Karen K Gleason

Emmanuel P Giannelis

Priscilla G Taylor

Daniel Herr

Guoping Mao

Eric A Lehner

Allen H Gabor

Lizabeth A Schneggenburger

Atsushi Shiota

Priscilla Dodson

Carl Lesley Willis

Konstantinos I Papathomas

Steven J Eickhoff

Amit Lal

Raymond W Wong

Steven Tin

Kuntack Lee

Sandip Tiwari

David W Wang

Evan L Schwartz

Melvin D Croucher

Kenneth Joseph Wynne

Paul Franklin Nealey

Edwin Lorimer Thomas

Hyosan Lee

Yongsun Ko

Jihoon Jeong

Jeffrey James Kriz

Michael Spencer

Jeff A Ridley

Yasuharu Murakami

Paul A Zimmerman

Franco Cerrina

Xiang-Qian Liu

Serhan Mehmet Ardanuc

Kazuki Kasahara

Michael L Hair

Kyoungseob Kim

Teruaki Hayakawa

James N Turner

Lawrence N Crane

Stephen B Wicker

Craig Jonathan Weinman

Stephen L Sass

Hon Hang Fong

Daewon Park

Ved Gund

Vasiliki Kosma

Lin Wang

Thomas Denis O'Rourke

Yuri Suzuki

Mufei Yu

Kenji Ogino

Alex Ruyack

Hong Xu

Jeremy Odent

Thomas Mates

Hwan-Kyu Kim

Chen Lin

Yuming Huang

Dale L Handlin

Rina Maeda

Wei Min Chan

Aristeidis Bakandritsos

Michael F Zettel

Markos Trikeriotis

Robert Rodriguez

Woo Jin Bae

Ekmini Anuja De Silva

Drew C Forman

Kyung-Min Kim

Junyan Dai

Nam-ho You

Maoliang Xiang

Young Cheol Bae

Jong-Wook Park

Shuyan Yu

Katherine Camera

Jin-Kyun Lee

Priscilla Taylor

Polymer nanostructures and compositions, devices, and systems comprising polymer nanostructures. In various examples, a composition, a device, or a system comprises a plurality of polymer nanostructures. The polymer nanostructures are disposed on a surface of a substrate. In various examples, the polymer nanostructures are disposed in pre-determined pattern on a surface of a substrate. In various examples, the polymer nanostructures are self-supporting. In various examples, a polymer nanostructure comprises a polypeptide group or the like. In various examples, a polymer nanostructure comprises an end group, such as, for example, a fluorescent end group, or the like. In various examples, a system is a sensor, which can be used to analyze a sample. In various examples, a composition, a device, or a system is used to analyze samples, such as, for example, samples comprising one or more volatile organic compound(s).

Polymer nanostructures, methods of making same, and uses thereof

The present inventive concepts provide metal etchant compositions and methods of fabricating a semiconductor device using the same. The metal etchant composition includes an organic peroxide in a range of about 0.1 wt % to about 20 wt %, an organic acid in a range of about 0.1 wt % to about 70 wt %, and an alcohol-based solvent in a range of about 10 wt % to about 99.8 wt %. The metal etchant composition may be used in an anhydrous system.

Metal etchant compositions and methods of fabricating a semiconductor device using the same

A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.

Radiation-sensitive composition and pattern-forming method

Embodiments herein provide for a self-destructing chip including at least a first die and a second die. The first die includes an electronic circuit, and the second die is composed of one or more polymers that disintegrates at a first temperature. The second die defines a plurality of chambers, wherein a first subset of the chambers contain a material that reacts with oxygen in an exothermic manner. A second subset of the chambers contain an etchant to etch materials of the first die. In response to a trigger event, the electronic circuit is configured to expose the material in the first subset of chambers to oxygen in order to heat the second die to at least the first temperature, and is configured to release the etchant from the second subset of the chambers to etch the first die.

Self-destructing chip

Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.

Block copolymers and lithographic patterning using same

An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical COas the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.

Orthogonal processing of organic materials used in electronic and electrical devices

A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.

Methods of making patterned structures of materials, patterned structures of materials, and methods of using same

A method for patterning biomaterials is presented. The biomaterials exhibit biological activity after patterning. The use of bio-compatible imaging materials and solvents allows conventional lithographic patterning methods to be applied to patterning biomolecules. The method allows deposition of multiple layers without subsequent layers affecting earlier laid deposits and can pattern multiple different biomolecules on a single surface.

Patterning of biomaterials using fluorinated materials and fluorinated solvents

Methods and compositions for obtaining patterned structures comprising fluorine-containing polymeric materials. The fluorine-containing polymeric materials have sufficient fluorine content such that the materials can be patterned using conventional photolithographic/pattern transfer methods and maintain desirable mechanical and physical properties. The patterned structures can be used, for example, in light-emitting devices.

Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers

A sensor system utilizing flexible electronics for on-line real-time high-sensitivity sampling, monitoring, and analysis of a parameter or analyte of interest in a fluid or in or on a solid is provided. The flexible substrate sensor system comprises a plurality of sensors, a flexible substrate, a network, and a connection between the sensors and the network, wherein the network reads out or collects information from the sensors. The network can be onboard, connected by via a physical connection to the sensors and the flexible substrate, or external to the sensors and flexible substrate, connected via a telemetric or wireless connection to the sensors. The flexible substrate sensor system can be deployed in systems that conduct or distribute fluids or solids, such as distribution systems (municipal water systems, oil or gas pipeline systems), industrial systems (production facilities, piping, and storage systems), and large structures (dams, bridges, walkways, buildings).

Flexible substrate sensor system for environmental and infrastructure monitoring

The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.

Photosensitive resin composition having a high refractive index

The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.

Photoacid generator compounds and compositions

The invention provides polymers, methods of preparing polymers, and compositions that include polymers, wherein said polymers include a plurality of two-carbon repeating units in a polymer chain, wherein one or more of the two-carbon repeating units of the polymer chain have a substituent that is covalently bonded to a semifluorinated alkyl ethoxy moiety, and the semifluorinated alkyl ethoxy moiety is attached to the polymer chain substituent through an ester, amide, ketone, carbamate, amine, or other suitable linking group. The polymers can be used to provide antifouling coatings.

Polymers and polymer coatings

Growing community of inventors

Ithaca, NY, United States of America

Christopher Kemper Ober