The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2017
Filed:
Sep. 06, 2012
Christopher K. Ober, Ithaca, NY (US);
Rina Maeda, Madison, WI (US);
Nam-ho You, Jeollabukdo, KR;
Teruaki Hayakawa, Tokyo, JP;
Christopher K. Ober, Ithaca, NY (US);
Rina Maeda, Madison, WI (US);
Nam-ho You, Jeollabukdo, KR;
Teruaki Hayakawa, Tokyo, JP;
Cornell University, Ithaca, NY (US);
Abstract
Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.