Nam-ho You

Title: The Innovations of Nam-ho You

Introduction

Nam-ho You is a prominent inventor based in Jeollabukdo, South Korea. He has made significant contributions to the field of materials science, particularly in the development of block copolymers. His work has implications for various applications, including lithography and filtration.

Latest Patents

Nam-ho You holds a patent for "Block copolymers and lithographic patterning using same." This patent describes block copolymers and methods for creating patterns of organic thin films using these copolymers. The innovative aspect of his work lies in the incorporation of a fluorinated block within the copolymers. The resulting thin films exhibit microdomains that can be aligned, allowing for the formation of patterns with dimensions smaller than those produced by traditional deep-UV or e-beam radiation. This technology has potential applications in lithography, filtration, and templating.

Career Highlights

Nam-ho You is affiliated with Cornell University, where he continues to advance research in his field. His academic background and ongoing projects contribute to the understanding and application of advanced materials.

Collaborations

He has collaborated with notable colleagues, including Christopher Kemper Ober and Rina Maeda, enhancing the scope and impact of his research.

Conclusion

Nam-ho You's innovative work in block copolymers represents a significant advancement in materials science, with promising applications across various industries. His contributions continue to shape the future of lithography and related technologies.