Location History:
- Gyeonggi-do, KR (2009 - 2011)
- Seoul, KR (2009 - 2013)
- Seongnam-si, KR (2014)
Company Filing History:
Years Active: 2009-2014
Title: Innovations of Choong-Man Lee
Introduction
Choong-Man Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work has been instrumental in advancing the capabilities of non-volatile memory devices.
Latest Patents
Among his latest patents are methods for fabricating a cell string and a non-volatile memory device that includes the cell string. This method involves forming an interlayer dielectric layer, a sacrificial layer, and a semiconductor pattern on a semiconductor substrate. The interlayer dielectric layer and the sacrificial layer are formed in a first direction parallel to the semiconductor substrate, while the semiconductor pattern is formed in a second direction perpendicular to the substrate. The process includes patterning the interlayer dielectric layer and the sacrificial layer to create an opening, filling this opening with metal, and annealing the semiconductor pattern. Another notable patent involves a germanium (Ge) compound with the chemical formula GeRxRy, where 'R' represents an alkyl group, and 'R' can be hydrogen, an amino group, an allyl group, or a vinyl group. This patent also covers methods of forming the Ge compound and fabricating phase change memory devices using it.
Career Highlights
Choong-Man Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the semiconductor field. His work has garnered attention for its potential applications in improving memory devices.
Collaborations
He collaborates with notable colleagues, including Sung-lae Cho and Jin-il Lee, who contribute to his research and development efforts.
Conclusion
Choong-Man Lee's contributions to semiconductor technology and his innovative patents highlight his role as a leading inventor in the industry. His work continues to influence advancements in memory devices and semiconductor fabrication methods.