The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2011

Filed:

Dec. 18, 2008
Applicants:

Yoon-jong Song, Seoul, KR;

Young-nam Hwang, Gyeonggi-do, KR;

Sang-don Nam, Seoul, KR;

Sung-lae Cho, Gyeonggi-do, KR;

Gwan-hyeob Koh, Seoul, KR;

Choong-man Lee, Gyeonggi-do, KR;

Bong-jin Kuh, Gyeonggi-do, KR;

Yong-ho Ha, Gyeonggi-do, KR;

Su-youn Lee, Gyeonggi-do, KR;

Chang-wook Jeong, Seoul, KR;

Ji-hye Yi, Gyeonggi-do, KR;

Kyung-chang Ryoo, Gyeonggi-do, KR;

Se-ho Lee, Seoul, KR;

Su-jin Ahn, Seoul, KR;

Soon-oh Park, Gyeonggi-do, KR;

Jang-eun Lee, Gyeonggi-do, KR;

Inventors:

Yoon-Jong Song, Seoul, KR;

Young-Nam Hwang, Gyeonggi-do, KR;

Sang-Don Nam, Seoul, KR;

Sung-Lae Cho, Gyeonggi-do, KR;

Gwan-Hyeob Koh, Seoul, KR;

Choong-Man Lee, Gyeonggi-do, KR;

Bong-Jin Kuh, Gyeonggi-do, KR;

Yong-Ho Ha, Gyeonggi-do, KR;

Su-Youn Lee, Gyeonggi-do, KR;

Chang-Wook Jeong, Seoul, KR;

Ji-Hye Yi, Gyeonggi-do, KR;

Kyung-Chang Ryoo, Gyeonggi-do, KR;

Se-Ho Lee, Seoul, KR;

Su-Jin Ahn, Seoul, KR;

Soon-Oh Park, Gyeonggi-do, KR;

Jang-Eun Lee, Gyeonggi-do, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 47/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A phase-change memory device has an oxidation barrier layer to protect against memory cell contamination or oxidation. In one embodiment, a semiconductor memory device includes a molding layer disposed over semiconductor substrate, a phase-changeable material pattern, and an oxidation barrier of electrically insulative material. The molding layer has a protrusion at its upper portion. One portion of the phase-changeable material pattern overlies the protrusion of the molding layer, and another portion of the phase-changeable material pattern extends through the protrusion. The electrically insulative material of the oxidation barrier may cover the phase-changeable material pattern and/or extend along and cover the entire area at which the protrusion of the molding layer and the portion of the phase-change material pattern disposed on the protrusion adjoin.


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