This inventor holds 14 USPTO granted patents. Top assignees: National Science Council, National Yang Ming Chiao Tung University, Industrial Technology Research Institute. Active years: 1997-2006.
Company Filing History:
9 out of 544 
2 out of 1,241 
1 out of 9,295 
Years Active: 1997-2006
Title: **Ching-Fa Yeh: A Pioneer in Thin Film Transistor Technology**
Introduction
Ching-Fa Yeh is a notable inventor based in Hsinchu, Taiwan, with an impressive portfolio consisting of 14 patents. His innovative contributions primarily focus on the fabrication methods of polycrystalline silicon thin film transistors, which have significant implications in various technological fields.
Latest Patents
One of his latest patents, titled "Method for fabrication of polycrystalline silicon thin film transistors," describes a groundbreaking technique. This invention enables the formation of a silicon spacer on the sidewall of the active layer of a thin film transistor (TFT). Through anisotropic plasma etching in a single direction, this spacer enhances laser recrystallization on the sidewall, effectively preventing the active layer from shrinkage or shelling-off post-laser recrystallization. As a result, large grains can form in the channel without the need for an additional mask during production. This method not only enhances the characteristics of the components but also improves uniformity and reduces production costs. These advancements are pivotal in the realm of low temperature polycrystalline silicon thin film transistors (LTPS-TFT).
Another noteworthy patent under his name also revolves around the fabrication of polycrystalline silicon film transistors. It details the use of a polysilicon spacer that caps the sidewall of the active layer through an isotropic dry etching process. This innovative method suppresses the active layer's shrinkage during laser recrystallization, resulting in large grain formations in the channel. The process, which employs a high-energy continuous wavelength laser or excimer laser for annealing, does not necessitate an additional mask, thus promoting a uniform arrangement of grain boundaries. These advancements significantly enhance device performance in LTPS-TFTs.
Career Highlights
Throughout his career, Ching-Fa Yeh has been associated with esteemed institutions such as the National Science Council, where he has significantly impacted research and development in thin film technology. His extensive body of work has garnered recognition and placed him on the cutting edge of innovations in the field.
Collaborations
Ching-Fa has collaborated with distinguished colleagues, including Yueh-Chuan Lee and Kwo-Hau Wu, in his pursuit of excellence in semiconductor technologies. These collaborations have fostered a creative environment that has led to significant advancements in the industry.
Conclusion
Ching-Fa Yeh's contributions to the fabrication of polycrystalline silicon thin film transistors have profoundly influenced the technological landscape. His innovative methodologies and commitment to enhancing device performance mark him as a leading figure in semiconductor research. With an impressive patent portfolio and collaborative spirit, he continues to pave the way for future developments in this vital field.