The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1997
Filed:
Jun. 06, 1996
Applicant:
Inventors:
Ching-Fa Yeh, Hsinchu, TW;
Tso-Hung Fan, Hsinchu, TW;
Assignee:
National Science Council, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B06B / ;
U.S. Cl.
CPC ...
427601 ; 4274301 ; 437225 ;
Abstract
A liquid phase deposition method involves a reaction mixture composed of a hydrosilicofluoric acid aqueous solution supersaturated with silicon dioxide, and a semiconductor substrate disposed therein. The reaction mixture is treated with an ultrasonic oscillation at a frequency ranging between 20 and 100 KHz and at a temperature ranging between 10.degree. and 50.degree. C. for accelerating the growth rate of a silicon dioxide layer formed on the semiconductor substrate.