Hsinchu, Taiwan

Chin-Lung Lin

This inventor holds 42 USPTO granted patents and 1 published patent application, primarily in Optical Proximity Correction. Top assignees: United Microelectronics Corp., Mediatek Corporation, Fujian Jinhua Integrated Circuit Co., Ltd.. Active years: 1997-2026.

USPTO Granted Patents = 42 

% Patents Active = 97.6

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 300(Granted Patents)


Location History:

  • Kaohsiung, TW (1997 - 2002)
  • Hsinchu Hsien, TW (2002 - 2007)
  • Hsinchu, TW (2006 - 2024)

Company Filing History:


Years Active: 1997-2026

Loading Chart...
Areas of Expertise:
HDMI Device
Power Saving Method
Optical Proximity Correction
Semiconductor Manufacturing
Lithography Process
Phase Shift Mask
Memory Device
Layout Pattern
Pattern Generation
Photomask
Trench Formation
Assist Feature
42 patents (USPTO):Explore Patents

Title: The Innovative Journey of Chin-Lung Lin

Introduction: Chin-Lung Lin, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Chin-Lung Lin's latest patents include advancements in semiconductor technology, particularly in the development of cutting-edge microchips for various electronic devices.

Career Highlights: With a career spanning over two decades, Chin-Lung Lin has worked tirelessly to push the boundaries of technological advancements. His work has been instrumental in shaping the landscape of the semiconductor industry.

Collaborations: Throughout his career, Chin-Lung Lin has collaborated with leading tech companies and research institutions to further his innovative projects. His ability to work in multidisciplinary teams has led to the successful implementation of several groundbreaking technologies.

Conclusion: Chin-Lung Lin's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a trailblazer in the field of semiconductor technology. His contributions continue to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…