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For the Inventor, By the Inventor

Tainan, Taiwan

Chih-Yi Wang

USPTO Granted Patents = 8

Average Co-Inventor Count = 6.1

ph-index = 2

Forward Citations = 34(Granted Patents)


Company Filing History:

goldMedal8 out of 7,074 
 
United Microelectronics Corp.
 patents

Years Active: 2018-2023

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8 patents (USPTO):Explore Patents
1. 11569235 - Semiconductor device and method of manufacturing the same (2023-01-31),
2. 10868011 - Semiconductor device and method of manufacturing the same (2020-12-15),
3. 10686079 - Fin field effect transistor structure with particular gate appearance (2020-06-16),
4. 10446682 - Method of forming semiconductor device (2019-10-15),
5. 10283415 - Semiconductor structure with a bump having a width larger than a width of fin shaped structures and manufacturing method thereof (2019-05-07),
6. 10217866 - Semiconductor device and method of forming the same (2019-02-26),
7. 10211107 - Method of fabricating fins including removing dummy fins after fluorocarbon flush step and oxygen clean step (2019-02-19),
8. 10109531 - Semiconductor structure having a bump lower than a substrate base and a width of the bump larger than a width of fin shaped structures, and manufacturing method thereof (2018-10-23),

Title: Innovations of Chih-Yi Wang in Semiconductor Technology

Introduction

Chih-Yi Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advancing semiconductor devices and manufacturing methods, which are crucial for modern electronics.

Latest Patents

One of Chih-Yi Wang's latest patents is a semiconductor device and method of manufacturing the same. This invention includes a substrate with multiple parallel fins protruding from it, isolated by trenches. The device features a device insulating layer on the trenches between two fins. The trench design includes a central first trench and two second trenches on either side, with the first trench being deeper than the second. The device insulating layer has a top plane, a first trench, and a second trench, with the fins protruding from the top plane. Notably, the bottom surface of the second trench is lower than that of the first trench, showcasing an innovative approach to semiconductor design.

Career Highlights

Chih-Yi Wang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to push the boundaries of semiconductor technology and contribute to the development of advanced electronic components.

Collaborations

Chih-Yi Wang has collaborated with notable coworkers, including Cheng-Pu Chiu and Tien-Shan Hsu. These collaborations have further enhanced the innovation and effectiveness of his projects in semiconductor technology.

Conclusion

Chih-Yi Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic devices, making a significant impact on the industry.

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