Hsinchu, Taiwan

Chih-Yang Pai


Average Co-Inventor Count = 4.1

ph-index = 6

Forward Citations = 186(Granted Patents)


Company Filing History:


Years Active: 2003-2023

where 'Filed Patents' based on already Granted Patents

16 patents (USPTO):

Title: Chih-Yang Pai: Innovator in Metal-Insulator-Metal Capacitor Technology

Introduction

Chih-Yang Pai is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of metal-insulator-metal (MIM) capacitors. With a total of 16 patents to his name, Pai's work has had a substantial impact on the industry.

Latest Patents

Chih-Yang Pai's latest patents focus on innovative MIM capacitor structures. One of his patents describes a MIM capacitor structure that includes a first electrode layer formed over a substrate, along with a first spacer on the sidewall of the first electrode layer. This structure also features a first dielectric layer that is in direct contact with the first spacer. Another patent elaborates on a similar MIM capacitor structure, detailing a substrate that comprises both a capacitor region and a non-capacitor region. This design includes a second electrode layer and a second spacer, which is in direct contact with the interface between the second electrode layer and a first dielectric layer.

Career Highlights

Chih-Yang Pai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to further his research and development in advanced capacitor technologies.

Collaborations

Chih-Yang Pai has collaborated with notable colleagues such as Kuo-Chi Tu and Wen-Chuan Chiang. These partnerships have contributed to the advancement of his innovative projects and patents.

Conclusion

Chih-Yang Pai is a distinguished inventor whose work in MIM capacitor technology has paved the way for advancements in semiconductor applications. His contributions continue to influence the industry and inspire future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…