HSINCHU, Taiwan

Chih-wei Chang

This inventor holds 40 USPTO granted patents and 45 published patent applications, primarily in Semiconductor Devices. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Realtek Semiconductor Inc., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chih-wei Chang. Retrieved from https://idiyas.com/inventor/chih-wei-chang-qyesaod8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 40 

% Patents Active = 77.5

Average Co-Inventor Count = 5.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2026

Loading Chart...
Areas of Expertise:
Semiconductor Devices
Fabrication Methods
Memory Controllers
Conductive Structures
Interconnect Structure
Power Delivery Structures
Contact Features
Thermal Properties
Fin Field-Effect Transistor
Dual Silicide
Via Connections
Routing Structure
40 patents (USPTO):Explore Patents

Title: The Innovative Journey of Chih-Wei Chang

Introduction: Chih-Wei Chang, an accomplished inventor based in Hsinchu, Taiwan, has made remarkable contributions to the field of semiconductor technology. With a portfolio of 10 patents, his innovative work continues to impact the industry significantly.

Latest Patents: Among his latest inventions, Chih-Wei Chang has developed several groundbreaking technologies. One of his notable patents is for a method involving the contact features of a semiconductor device. This method details a process that includes forming a dielectric layer over an epitaxial source/drain region, creating an opening that exposes a part of the region, and subsequently applying a barrier layer. This innovative process also incorporates an oxidation technique that transforms parts of the barrier layer, enhancing the structural integrity and performance of the semiconductor device.

Another significant patent involves the manufacturing of semiconductor structures, where a first conductive feature is created within a trench through Physical Vapor Deposition (PVD). This feature is then protected by a glue layer prior to the Chemical Vapor Deposition (CVD) of a second conductive feature, which ensures better adhesion and prevents damage to the silicide during metal deposition.

Career Highlights: Chih-Wei Chang has gained valuable experience while working with industry leaders such as Taiwan Semiconductor Manufacturing Company Ltd. and Realtek Semiconductor Inc. His tenure in these organizations has allowed him to refine his expertise and contribute to various innovative projects.

Collaborations: Throughout his career, Chih-Wei has worked closely with talented colleagues, including Wei-Yip Loh and Hung-Hsu Chen. Their collaborations have fostered a dynamic exchange of ideas, leading to advancements in semiconductor technologies.

Conclusion: Chih-Wei Chang stands out as a leading innovator in semiconductor technology through his patents and contributions to reputable companies. His continued work in advancing semiconductor manufacturing processes ensures that he will remain an influential figure in the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…