Chih-Tsung Shih

Title: Chih-Tsung Shih: Pioneering Innovations in Semiconductor Technology

Introduction:

Throughout his illustrious career, Chih-Tsung Shih has established himself as a trailblazing innovator in the field of semiconductor technology. His groundbreaking ideas and relentless pursuit of excellence have not only revolutionized existing technologies but have also paved the way for new advancements. With over 100 patents to his name, Shih is a driving force behind cutting-edge developments in lithography and extreme ultraviolet (EUV) mask manufacturing.

Latest Patents:

Shih's recent patents highlight his expertise in EUV lithography mask and its porous reflective multilayer structure. One of his latest inventions is the EUV lithography mask with a porous reflective multilayer structure. This mask includes a substrate made of a low thermal expansion material (LTEM) and a reflective structure comprised of a first layer and a second layer, at least the second layer being porous. By introducing porosity into the reflective layers, Shih's design provides enhanced performance and improves lithography accuracy.

Another notable patent is the extreme ultraviolet mask, which comprises a multilayer Mo/Si stack, a ruthenium (Ru) capping layer, and an absorber layer. This highly advanced mask is capable of achieving exceptional precision in circuit pattern replication, making it an invaluable tool in the semiconductor industry.

Career Highlights:

Chih-Tsung Shih has enjoyed an esteemed career with notable contributions to renowned organizations. He has made significant contributions during his tenure at the Taiwan Semiconductor Manufacturing Company Limited (TSMC) and the Industrial Technology Research Institute (ITRI). Through these collaborations, Shih has harnessed his expertise in semiconductor technologies and has played a pivotal role in driving innovation in these prominent industry players.

Collaborations:

Throughout his career, Chih-Tsung Shih has worked alongside distinguished colleagues, further fostering a culture of innovation and driving collaborative breakthroughs. One such collaborator is Jeng-Horng Chen, who has worked closely with Shih on various research projects, contributing to the development of groundbreaking technologies.

Additionally, Shinn-Sheng Yu has been a valuable collaborator, partnering with Shih to bring novel concepts to fruition and enhancing the overall impact of their research endeavors.

Conclusion:

Chih-Tsung Shih's exceptional accomplishments and groundbreaking patent contributions have had a profound impact on the world of semiconductor technology. Through his innovative ideas and meticulous approach, Shih has revolutionized lithography and EUV mask manufacturing. His collaborations with esteemed organizations and accomplished colleagues further underscore his commitment to driving advancements in the industry. As the field of semiconductor technology continues to evolve, Chih-Tsung Shih's contributions will undoubtedly serve as a foundation for future breakthroughs and shape the trajectory of the industry for years to come.