Chih-Chien Chang

Title: Innovations by Chih-Chien Chang in Semiconductor Technology

Introduction

Chih-Chien Chang, a prominent inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology with a remarkable portfolio of 18 patents. His innovative designs and methodologies have paved the way for advancements in power devices and semiconductor devices, which are crucial for modern electronic applications.

Latest Patents

Chang's latest patents include a sophisticated power device and its fabrication method. This device features a substrate, an ion well, a body region, source and drain doped regions, and multiple gates strategically positioned on the substrate. The configuration includes a first gate adjacent to the source region, a second gate near the drain region, and an innovative stacked gate structure positioned between them.

In addition, Chang has developed a semiconductor device that incorporates a semiconductor substrate, an advanced gate structure, source and drain regions, and dual oxide layers. This design enhances the operational efficiency of semiconductor devices, meeting the demands of contemporary electronics.

Career Highlights

Chih-Chien Chang has held influential roles in leading technology companies such as United Microelectronics Corporation and Realtek Semiconductor Inc. His work at these organizations has been instrumental in advancing semiconductor technologies and has had a lasting impact on the industry.

Collaborations

Throughout his career, Chang has collaborated with notable professionals in the field, including colleagues Shen-De Wang and Jianjun Yang. These partnerships have fostered a collaborative environment that encourages innovation and the exchange of ideas, resulting in further advancements in semiconductor technology.

Conclusion

Chih-Chien Chang's dedication to innovation and excellence in semiconductor design is evident through his patents and contributions to the industry. As technology continues to evolve, his work will likely remain influential, inspiring future advancements and innovations in semiconductor applications.