The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Nov. 18, 2015
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Yuan-Hsiang Chang, Hsinchu, TW;

Shen-De Wang, Hsinchu County, TW;

Chih-Chien Chang, Hsinchu, TW;

Jianjun Yang, Singapore, SG;

Aaron Chen, Singapore, SG;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 21/265 (2006.01); H01L 21/321 (2006.01); H01L 21/223 (2006.01); H01L 21/285 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01); H01L 29/51 (2006.01); H01L 27/11521 (2017.01);
U.S. Cl.
CPC ...
H01L 29/42328 (2013.01); H01L 21/223 (2013.01); H01L 21/26586 (2013.01); H01L 21/28273 (2013.01); H01L 21/28562 (2013.01); H01L 21/31111 (2013.01); H01L 21/321 (2013.01); H01L 21/32133 (2013.01); H01L 27/11521 (2013.01); H01L 29/42324 (2013.01); H01L 29/513 (2013.01); H01L 29/518 (2013.01); H01L 29/6656 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01);
Abstract

A flash cell includes a gate and an erase gate. The gate is disposed on a substrate, wherein the gate includes a control gate on the substrate and a floating gate having a tip between the substrate and the control gate. The erase gate is disposed beside the gate, wherein the tip points toward the erase gate. The present invention also provides a flash cell forming process including the following steps. A gate is formed on a substrate, wherein the gate includes a floating gate on the substrate. An implantation process is performed on a side part of the floating gate, thereby forming a first doped region in the side part. At least a part of the first doped region is oxidized, thereby forming a floating gate having a tip.


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