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For the Inventor, By the Inventor

Hsinchu, Taiwan

Chia-Wei Chen

This inventor holds 29 USPTO granted patents and 17 published patent applications, primarily in Semiconductor Fabrication. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Wei Chen. Retrieved from https://idiyas.com/inventor/chia-wei-chen-7evif6ss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 93.1

Average Co-Inventor Count = 6.1

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Chiayi, TW (2020 - 2023)
  • Hsinchu, TW (2017 - 2024)

Company Filing History:

goldMedal29 out of 42,810 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2017-2026

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Areas of Expertise:
Semiconductor Device
Gate Structure
High-k Dielectric
Metal Oxide Layer
Low-resistance Layer
Transistor Design
Integrated Circuit
Nano-sheet Technology
Contact Formation
Dielectric Processing
Gate-all-around Devices
Capping Layer
29 patents (USPTO):Explore Patents
1. 12635161 - Method of manufacturing a semiconductor device and a semiconductor device (2026-05-19),
2. 12604723 - Metal capping layer for reducing gate resistance in semiconductor devices (2026-04-14),
3. 12484274 - Techniques for semiconductor gate and contact formation to reduce seam formation (2025-11-25),
4. 12464789 - Semiconductor device structure and method for forming the semiconductor device structure (2025-11-04),
5. 12464773 - Formation of a semiconductor device with a gate containing a metal oxide layer using an oxidation process (2025-11-04),
6. 12433011 - Post gate dielectric processing for semiconductor device fabrication (2025-09-30),
7. 12414329 - Forming low-resistance capping layer over metal gate electrode (2025-09-09),
8. 12336244 - Metal caps for gate structures (2025-06-17),
9. 12294030 - Nano-sheet-based complementary metal-oxide-semiconductor devices with asymmetric inner spacers (2025-05-06),
10. 12288811 - Metal gate for gate-all-around devices and methods for forming the same (2025-04-29),
11. 12255104 - Semiconductor device and method of manufacture (2025-03-18),
12. 12230713 - Semiconductor device structure and methods of forming the same (2025-02-18),
13. 12171091 - Multi-layer high-k gate dielectric structure (2024-12-17),
14. 12152303 - Intersecting module (2024-11-26),
15. 12094948 - Forming low-resistance capping layer over metal gate electrode (2024-09-17),

Title: The Innovative Journey of Chia-Wei Chen

Introduction: Chia-Wei Chen, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Chia-Wei Chen's latest patents showcase his expertise in areas such as semiconductor technology, renewable energy solutions, and advanced manufacturing processes.

Career Highlights: Throughout his illustrious career, Chia-Wei Chen has been instrumental in developing cutting-edge technologies that have revolutionized various industries. His work has been recognized globally for its impact and ingenuity.

Collaborations: Chia-Wei Chen has collaborated with leading research institutions, universities, and tech companies to further his research and bring his inventions to life. His collaborative efforts have resulted in the successful implementation of innovative solutions in real-world applications.

Conclusion: Chia-Wei Chen's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the ever-evolving landscape of inventions and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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