Cheng-Han Lee

Title: Cheng-Han Lee: Innovating the Semiconductor Industry

Introduction:

Cheng-Han Lee, a Taipei-based inventor, has made significant contributions to the semiconductor industry with his extensive portfolio of patents. With over 119 patents to his name, Lee's innovative ideas have pushed the boundaries of semiconductor technology. This article delves into his latest patents, career highlights, and notable collaborations within the industry.

Latest Patents:

Lee's recent patents exhibit his expertise in enhancing the performance of semiconductor devices. One notable invention is the "Dopant concentration boost in epitaxially formed material." This patent focuses on improving the dopant concentration in the source/drain regions of a semiconductor device. By embedding distinct boosting layers of a different material within a doped epitaxy, Lee's method enhances the device's overall performance.

Another patent exemplifying Lee's contributions is his invention of the "Method of forming fully strained channels." This method involves epitaxially growing a second layer comprising silicon germanium (SiGe) over an initial layer, all performed under the same temperature. This technique is crucial for enhancing the performance of transistors and the overall efficiency of semiconductor devices.

Career Highlights:

Lee's contributions to the semiconductor industry extend beyond his extensive patent portfolio. He has held notable positions at renowned companies, including Taiwan Semiconductor Manufacturing Company Ltd. (TSMC). TSMC is a global leader in semiconductor manufacturing, and Lee's association with the company demonstrates his commitment to innovation in the field.

Collaborations:

Throughout his career, Cheng-Han Lee has collaborated with esteemed colleagues to develop groundbreaking technologies. Notable among them are his coworkers, Chin-Fu Chang and Chi-Hao Tang. These collaborations have resulted in the advancement of semiconductor technologies and further solidified Lee's position as a respected figure in the industry.

Conclusion:

Cheng-Han Lee's extensive patent portfolio and significant contributions to the semiconductor industry have positioned him as an innovator and thought leader in his field. His patents, such as the "Dopant concentration boost in epitaxially formed material" and the "Method of forming fully strained channels," showcase his expertise in enhancing the performance of semiconductor devices. With his notable career highlights and collaborations, Lee continues to drive innovation in the industry and shape the future of semiconductor technology.