This inventor holds 9 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2013-2017.
Company Filing History:
Years Active: 2013-2017
Title: Bor-Shyang Liao: Innovator in Semiconductor Technology
Introduction
Bor-Shyang Liao is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His innovative approaches have advanced the processes involved in semiconductor fabrication.
Latest Patents
Liao's latest patents include a semiconductor process that involves several steps. This process begins with a wafer placed on a pedestal, which is then lifted to approach a heating source. An etching process is performed on the wafer, followed by an annealing process using the heating source. In another variation, a wafer on a pedestal and a heating source positioned on the same side of the wafer as the pedestal are utilized. The etching process is conducted by ensuring that the temperature difference between the heating source and the pedestal exceeds 180° C. Additionally, he has developed a method for fabricating a semiconductor device. This method involves providing a substrate that has a nitride layer and a platinum (Pt)-containing nickel (Ni)-semiconductor compound layer. The nitride layer and the Pt are then removed in situ using a chemical solution that includes components of sulfuric acid and phosphoric acid.
Career Highlights
Bor-Shyang Liao is currently associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Liao has collaborated with notable coworkers, including Kuo-Chih Lai and Shu Min Huang. Their combined expertise has contributed to the successful development of innovative semiconductor technologies.
Conclusion
Bor-Shyang Liao's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor fabrication processes.