Fremont, CA, United States of America

Bi-Ming Yen

This inventor holds 11 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2003-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bi-Ming Yen. Retrieved from https://idiyas.com/inventor/bi-ming-yen-42yksrev

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 45.5

Average Co-Inventor Count = 5.9

ph-index = 5

Forward Citations = 224(Granted Patents)


Company Filing History:


Years Active: 2003-2014

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11 patents (USPTO):Explore Patents

Title: Celebrating the Innovative Contributions of Bi-Ming Yen

Introduction

Bi-Ming Yen is an accomplished inventor based in Fremont, California. With an impressive portfolio featuring 11 patents, he has made significant contributions to the field of semiconductor processing. His innovative techniques are shaping the future of technology and improving manufacturing processes in various applications.

Latest Patents

Among Bi-Ming Yen's latest patents are groundbreaking methods that enhance the efficiency of plasma etching processes. One notable invention is the "In-situ photoresist strip during plasma etching of active hard mask." This method allows for the etching of features in a silicon layer while streamlining the hard mask and photoresist stripping process. By utilizing a stripping gas and generating plasma through controlled radio-frequency power, this innovation optimizes the use of equipment and improves results.

Another patent, titled "Uniform etch system," introduces a method for etching a layer over a substrate with enhanced precision. By employing different gases in separate zones within a plasma processing chamber, Bi-Ming Yen's approach allows for simultaneous plasma generation, leading to more uniform etching results.

Career Highlights

Bi-Ming Yen's career is closely associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing etching and processing technologies, contributing to the development of devices used in a vast array of electronic applications. His inventions have helped streamline processes, reduce costs, and enhance product quality.

Collaborations

Throughout his career, Bi-Ming has collaborated with notable colleagues, including Peter K. Loewenhardt and Sean S. Kang. These partnerships have fostered a creative environment where innovative ideas can flourish, resulting in advancements that benefit the entire industry.

Conclusion

With a strong commitment to innovation and a track record of impactful patents, Bi-Ming Yen continues to be a driving force in the semiconductor field. His contributions reflect a dedication to advancing technology and enhancing manufacturing processes, making him a celebrated figure among inventors and within the industry. As he continues to develop new ideas, the influence of his work is likely to grow, shaping the future of technology for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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