The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Dec. 13, 2002
Dean J. Larson, Pleasanton, CA (US);
Babak Kadkhodayan, Hayward, CA (US);
Di Wu, Newark, CA (US);
Kenji Takeshita, Fremont, CA (US);
Bi-ming Yen, Fremont, CA (US);
Xingcai Su, Fremont, CA (US);
William M. Denty, Jr., San Jose, CA (US);
Peter Loewenhardt, Pleasanton, CA (US);
Dean J. Larson, Pleasanton, CA (US);
Babak Kadkhodayan, Hayward, CA (US);
Di Wu, Newark, CA (US);
Kenji Takeshita, Fremont, CA (US);
Bi-Ming Yen, Fremont, CA (US);
Xingcai Su, Fremont, CA (US);
William M. Denty, Jr., San Jose, CA (US);
Peter Loewenhardt, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.