Colfax, NC, United States of America

Andrew P Ritenour

This inventor holds 31 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Semiconductor Technology. Top assignees: E Ink Corporation, Rf Micro Devices, Inc., Qorvo US, Inc.. Active years: 2006-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew P Ritenour. Retrieved from https://idiyas.com/inventor/andrew-p-ritenour

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 45.2


Average Co-Inventor Count = 2.0

ph-index = 10

Forward Citations = 1,536(Granted Patents)


Location History:

  • Medford, MA (US) (2006 - 2007)
  • Caledonia, MS (US) (2011)
  • Arlington, MA (US) (2008 - 2013)
  • Starkville, MS (US) (2011 - 2013)
  • Colfax, NC (US) (2013 - 2022)

Company Filing History:


Years Active: 2006-2022

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Areas of Expertise:
Titanium-Alloyed Surface
EOS Protection
Heat Dissipation
Electro-Optic Display
Gallium Nitride
Field Effect Transistor
Vertical Junction Transistors
Backplane Processes
Thermal Characteristics
Leakage Current
Patterned Semiconductors
Enhanced Conduction
31 patents (USPTO):Explore Patents

Title: Andrew P Ritenour: Pioneering Innovation through Collaborations

Introduction:

In the world of innovation and patents, Andrew P Ritenour from Colfax, NC, has established himself as a prominent figure. With an impressive portfolio of 31 patents, his expertise lies in developing devices with titanium-alloyed surfaces. This article explores Ritenour's latest patents, career highlights, and his collaborations with other inventors, researchers, and professionals.

Latest Patents:

Ritenour's latest patents highlight his ingenuity in creating devices with titanium-alloyed surfaces. One of his recent inventions is a device that involves a crystalline substrate and a patterned aluminum-based material layer with a titanium-alloyed surface. This device, which also features a titanium-based material layer in select portions, enables the realization of surface wave acoustic (SAW) devices. The SAW-based filters produced by this technology have significant applications in wireless communication equipment.

Career Highlights:

Throughout his career, Ritenour's contributions have proven invaluable to various companies in the innovation landscape. He has made significant strides as an inventor, researcher, and professional. Two notable companies where he has worked include E Ink Corporation and RF Micro Devices, Inc.

At E Ink Corporation, Ritenour likely played a key role in developing electronic paper display technology. E Ink Corporation is a renowned industry leader in this field, making it an excellent platform for Ritenour's innovative pursuits.

Similarly, at RF Micro Devices, Inc., Ritenour would have contributed to advancements in radio-frequency and microwave components. RF Micro Devices, now part of Qorvo Inc., specializes in designing and manufacturing cutting-edge semiconductor technologies for wireless communication applications.

Collaborations:

Collaboration is a cornerstone of innovation, and Ritenour has actively engaged with other inventors, researchers, and professionals in his quest to push the boundaries of technology. One of his collaborations includes working with Peter T Kazlas, whose expertise may have complemented Ritenour's own skills, contributing to the success of their joint endeavors.

Additionally, Ritenour has collaborated with Gregg Michael Duthaler, further expanding the network of professionals actively involved in the pursuit of innovation.

Conclusion:

Andrew P Ritenour's passion for innovation and drive for collaboration have led to significant advancements in device design and wireless communication technology. With an impressive patent portfolio and experience working with notable companies such as E Ink Corporation and RF Micro Devices, Inc., Ritenour's contributions continue to shape the field of invention.

As the world progresses, Ritenour's expertise and collaborative approach will likely pave the way for further breakthroughs, inspiring future inventors and professionals in their pursuit of innovative solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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