Alex K H See

This inventor holds 12 USPTO granted patents. Top assignees: Globalfoundries Singapore Pte. Ltd., Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2010-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alex K H See. Retrieved from https://idiyas.com/inventor/alex-k-h-see

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12

% Patents Active = 66.7

Average Co-Inventor Count = 5.2

ph-index = 4

Forward Citations = 34(Granted Patents)

Company Filing History:

7 out of 1,060

Globalfoundries Singapore Pte. Ltd.

patents

5 out of 962

Chartered Semiconductor Manufacturing Ltd (Corporation)

patents

Years Active: 2010-2014

Loading Chart...

12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8912102 - Laser annealing (2014-12-16),

2. 8860142 - Method and apparatus to reduce thermal variations within an integrated circuit die using thermal proximity correction (2014-10-14),

3. 8754447 - Strained channel transistor structure and method (2014-06-17),

4. 8716076 - Method for fabricating a semiconductor device having an epitaxial channel and transistor having same (2014-05-06),

5. 8354347 - Method of forming high-k dielectric stop layer for contact hole opening (2013-01-15),

6. 8058123 - Integrated circuit and method of fabrication thereof (2011-11-15),

7. 8012839 - Method for fabricating a semiconductor device having an epitaxial channel and transistor having same (2011-09-06),

8. 7960283 - Method for reducing silicide defects in integrated circuits (2011-06-14),

9. 7892900 - Integrated circuit system employing sacrificial spacers (2011-02-22),

10. 7795680 - Integrated circuit system employing selective epitaxial growth technology (2010-09-14),

11. 7776699 - Strained channel transistor structure and method (2010-08-17),

12. 7745320 - Method for reducing silicide defects in integrated circuits (2010-06-29),

Title: The Innovative Mind of Alex K H See: A Pioneer in Semiconductor Technology

Introduction

Alex K H See is a renowned inventor based in Singapore who has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 12 patents, he has demonstrated a strong commitment to innovation and excellence in his work. His inventions focus primarily on improving the fabrication processes of semiconductor devices, which play a crucial role in modern electronics.

Latest Patents

Among his recent patents are advancements in laser annealing and thermal proximity correction techniques. The laser annealing patent describes a system and method for processing semiconductor wafers with precision. This technology segments the first and second surfaces of the wafer into multiple zones, allowing for synchronized processing to minimize thermal variations and enhance performance. Additionally, his method for reducing thermal variations within integrated circuit dies utilizes thermal proximity correction techniques. By assessing the thermal properties of structures, he can modify designs to align temperature outcomes with predetermined targets, thus improving device performance by mitigating local variations caused by thermal discrepancies.

Career Highlights

Throughout his career, Alex has worked with leading companies in the industry, including GlobalFoundries Singapore Pte. Ltd. and Chartered Semiconductor Manufacturing Ltd. His tenure at these organizations has allowed him to work on cutting-edge technologies and collaborate with some of the brightest minds in semiconductor research and development.

Collaborations

Collaboration is a hallmark of Alex K H See's innovative journey. He has worked alongside talented professionals such as Mei Sheng Zhou and Liang Choo Hsia, reinforcing the importance of teamwork in driving technological advancements. Together, they have contributed valuable insights and solutions to the semiconductor industry.

Conclusion

In conclusion, Alex K H See is a pivotal figure in the semiconductor domain, with a proven track record of innovation reflected in his 12 patents. His contributions to laser annealing and thermal proximity correction techniques showcase his dedication to improving semiconductor fabrication processes. As technology continues to evolve, the impact of his work will undoubtedly play a significant role in shaping the future of electronics.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]