The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Dec. 07, 2007
Huang Liu, Singapore, SG;
Alex K. H. See, Singapore, SG;
James Lee, Singapore, SG;
Johnny Widodo, Singapore, SG;
Chung Woh Lai, Singapore, SG;
Wenzhi Gao, Singapore, SG;
Zhao Lun, Singapore, SG;
Shailendra Mishra, Singapore, SG;
Liang-choo Hsia, Singapore, SG;
Huang Liu, Singapore, SG;
Alex K. H. See, Singapore, SG;
James Lee, Singapore, SG;
Johnny Widodo, Singapore, SG;
Chung Woh Lai, Singapore, SG;
Wenzhi Gao, Singapore, SG;
Zhao Lun, Singapore, SG;
Shailendra Mishra, Singapore, SG;
Liang-Choo Hsia, Singapore, SG;
Chartered Semiconductor Manufacturing Ltd., Singapore, SG;
Abstract
An integrated circuit system that includes: providing a substrate; depositing a dielectric on the substrate; depositing an isolation dielectric on the dielectric; forming a trench through the isolation dielectric and the dielectric to expose the substrate; depositing a dielectric liner over the integrated circuit system; processing the dielectric liner to form a trench spacer; and depositing an epitaxial growth within the trench that includes a crystalline orientation that is substantially identical to the substrate.