Albrecht Hof

Title: Albrecht Hof: Innovator in Lithography Technology

Introduction

Albrecht Hof is a prominent inventor based in Aalen, Germany, known for his significant contributions to lithography technology. With a total of 15 patents to his name, Hof has made remarkable advancements in the field, particularly in optical systems and lithography mask apparatuses.

Latest Patents

Hof's latest patents include an "Apparatus and method for bearing a lithography mask." This invention features a resting support holder designed to bear a lithography mask, equipped with bearing points that ensure uniform support. Notably, the resting support holder can have exactly four bearing points, with a method that adjusts the height of the fourth bearing point to balance the supporting force across all points. Another significant patent is for an "Optical system, in particular in a microlithographic projection exposure apparatus." This optical system comprises two components and a measurement arrangement that determines their relative position in six degrees of freedom, enhancing precision in microlithography.

Career Highlights

Throughout his career, Albrecht Hof has worked with esteemed organizations such as Carl Zeiss Stiftung and Carl Zeiss SMT GmbH. His work in these companies has been instrumental in advancing lithography technologies and optical systems.

Collaborations

Hof has collaborated with notable professionals in the field, including Adalbert Hanssen and Klaus Mehlkopp. These collaborations have contributed to the development of innovative solutions in lithography and optical systems.

Conclusion

Albrecht Hof's contributions to lithography technology and optical systems have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology in this critical area.