The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Jul. 01, 2002
Applicants:
Albrecht Hof, Aalen, DE;
Guenter Maul, Aalen, DE;
Michael Muehlbeyer, Aalen, DE;
Klaus Mehlkopp, Alsdorf, DE;
Inventors:
Albrecht Hof, Aalen, DE;
Guenter Maul, Aalen, DE;
Michael Muehlbeyer, Aalen, DE;
Klaus Mehlkopp, Alsdorf, DE;
Assignee:
Carl Zeiss Semiconductor Manufacturing Technologies AG, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B009/02 ;
U.S. Cl.
CPC ...
Abstract
An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.