Company Filing History:
Years Active: 2002-2006
Title: Guenter Maul: Innovator in Projection Exposure Technology
Introduction
Guenter Maul is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of projection exposure technology, holding a total of 4 patents. His work has been instrumental in advancing the efficiency and effectiveness of various measurement instruments and exposure apparatuses.
Latest Patents
One of Guenter Maul's latest patents is a device for sealing a projection exposure apparatus. This apparatus is equipped with an illumination system, a reticle, a projection objective, and an image plane. The interstitial spaces between the individual elements of the apparatus are open to the ambient space. To address this, a gas purge device that carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. This gas purge device is designed to effectively seal off one or more interstitial spaces from the surrounding ambient space.
Another significant patent is a device for holding measurement instruments, particularly interferometers. This device is constructed from multiple structural elements connected to one another, made from at least one material with a very low coefficient of thermal expansion. The structure elements that support the measurement instruments are secured between at least two structural side parts, ensuring that thermal expansions do not affect the measurement direction of the instruments.
Career Highlights
Throughout his career, Guenter Maul has worked with prominent companies such as Carl Zeiss SMT AG and Carl Zeiss Stiftung. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in his field.
Collaborations
Guenter Maul has collaborated with notable colleagues, including Michael Muehlbeyer and Albrecht Hof. These partnerships have fostered an environment of innovation and creativity, leading to advancements in technology.
Conclusion
Guenter Maul's contributions to the field of projection exposure technology and measurement instruments highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving the efficiency and accuracy of complex systems.