The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Feb. 25, 2005
Albrecht Hof, Aalen, DE;
Guenter Maul, Aalen, DE;
Lothar Gail, Wiesbaden, DE;
Wilfried Schierholz, Hochheim, DE;
Eberhard Jost, Hattersheim, DE;
Albrecht Hof, Aalen, DE;
Guenter Maul, Aalen, DE;
Lothar Gail, Wiesbaden, DE;
Wilfried Schierholz, Hochheim, DE;
Eberhard Jost, Hattersheim, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.