Carl-zeiss-smt Ag

Carl-zeiss-stiftung

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Carl Zeiss Smt Gmbh

Guenter Maul

Albrecht Hof

Michael Muehlbeyer

Bernhard Gellrich

Thomas Bischoff

Michael Trunz

Lothar Gail

Klaus Mehlkopp

Eberhard Jost

Wilfried Schierholz

Norbert Hubig

Karlheinz Schuster

A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.

Device for sealing a projection exposure apparatus

A device for holding measurement instruments (), in particular interferometers, is formed from a plurality of structure elements () connected to one another and made from at least one material. The at least one material has a very low coefficient of thermal expansion &#x3b1;. The structure elements () on which the measurement instruments () are arranged are secured between at least two structure side parts () in such a way that the thermal expansions of the structure side parts () and of the connections () have no effect in the measurement direction of the measurement instruments ().

Device for holding measurement instruments

An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.

Optical system with isolated measuring structure

An optical imaging device, in particular a lens system, has a system diaphragm ( ). An aperture of the system diaphragm ( ) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm ( ) with respect to the optical axis ( ) of the system diaphragm ( ) is fixed in dependence on the opening diameter (D) of the system diaphragm ( ).

Optical imaging device, in particular lens system, with at least one system diaphragm

Growing community of inventors

Aalen, Germany

Guenter Maul