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For the Inventor, By the Inventor

Pleasanton, CA, United States of America

Adrianne K Tipton

This inventor holds 18 USPTO granted patents and 2 published patent applications, primarily in Silica Nanolaminate Deposition. Top assignee: Novellus Systems Incorporated. Active years: 2004-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adrianne K Tipton. Retrieved from https://idiyas.com/inventor/adrianne-k-tipton

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18 

% Patents Active = 61.1

Average Co-Inventor Count = 5.7

ph-index = 13

Forward Citations = 2,549(Granted Patents)


Location History:

  • Fremont, CA (US) (2004 - 2007)
  • Pleasanton, CA (US) (2006 - 2010)

Company Filing History:

goldMedal18 out of 993 
 
Novellus Systems Incorporated
 patents

Years Active: 2004-2010

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Areas of Expertise:
Silica Thin Films
Rapid Vapor Deposition
Nanolaminate Dielectric
Photoresist Removal
Supercritical Fluid Processing
Porogen Removal
Thin Film Densification
Modulation of Precursor Exposure
Etch Bag Gap Fill
Aluminum Phosphate Incorporation
18 patents (USPTO):Explore Patents
1. 7790633 - Sequential deposition/anneal film densification method (2010-09-07),
2. 7700155 - Method and apparatus for modulation of precursor exposure during a pulsed deposition process (2010-04-20),
3. 7482247 - Conformal nanolaminate dielectric deposition and etch bag gap fill process (2009-01-27),
4. 7297608 - Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition (2007-11-20),
5. 7294583 - [object Object] (2007-11-13),
6. 7271112 - Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry (2007-09-18),
7. 7223707 - Dynamic rapid vapor deposition process for conformal silica laminates (2007-05-29),
8. 7208389 - Method of porogen removal from porous low-k films using UV radiation (2007-04-24),
9. 7202185 - Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer (2007-04-10),
10. 7148155 - Sequential deposition/anneal film densification method (2006-12-12),
11. 7129189 - Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) (2006-10-31),
12. 7097878 - [object Object] (2006-08-29),
13. 6905556 - Method and apparatus for using surfactants in supercritical fluid processing of wafers (2005-06-14),
14. 6867152 - Properties of a silica thin film produced by a rapid vapor deposition (RVD) process (2005-03-15),
15. 6848455 - Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species (2005-02-01),

Title: The Innovative Journey of Adrianne K Tipton

Introduction: Adrianne K Tipton, a pioneering inventor based in Pleasanton, CA, has made significant contributions to the world of innovation with her creative and forward-thinking ideas.

Latest Patents: Adrianne K Tipton holds several patents in various fields, including technology, healthcare, and sustainability. Her most recent patent focuses on a groundbreaking eco-friendly packaging solution that has the potential to revolutionize the industry.

Career Highlights: With a background in engineering and a passion for problem-solving, Adrianne has enjoyed a successful career marked by numerous achievements. She has been recognized for her innovative approach to product development and her ability to think outside the box.

Collaborations: Throughout her career, Adrianne has collaborated with leading experts in the field to bring her ideas to life. Her partnerships with top research institutions and industry professionals have been instrumental in the success of her projects.

Conclusion: Adrianne K Tipton's dedication to innovation and her relentless pursuit of excellence have established her as a prominent figure in the world of inventors. Her work continues to inspire and shape the future of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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