The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Apr. 08, 2004
Francisco Juarez, Fremont, CA (US);
Dennis Hausmann, Los Gatos, CA (US);
Bunsen Nie, Fremont, CA (US);
Teresa Pong, Dublin, CA (US);
Adrianne Tipton, Pleasanton, CA (US);
Patrick Van Cleemput, Sunnyvale, CA (US);
Francisco Juarez, Fremont, CA (US);
Dennis Hausmann, Los Gatos, CA (US);
Bunsen Nie, Fremont, CA (US);
Teresa Pong, Dublin, CA (US);
Adrianne Tipton, Pleasanton, CA (US);
Patrick Van Cleemput, Sunnyvale, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A method of depositing material on a substrate comprises providing a reactor with a reaction chamber having a first volume, and contacting a surface of a substrate in the reaction chamber with a first precursor at the first chamber volume to react with and deposit a first layer on the substrate. The method further includes enlarging the reaction chamber to a second, larger volume and removing undeposited first precursor and any excess reaction product to end reaction of the first precursor with the substrate.