The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Dec. 30, 2004
George D. Papasouliotis, Sunnyvale, CA (US);
Raihan M. Tarafdar, San Jose, CA (US);
Adrianne K. Tipton, Pleasanton, CA (US);
Ron Rulkens, Milpitas, CA (US);
Dennis M. Hausmann, Los Gatos, CA (US);
Jeff Tobin, Mountain View, CA (US);
George D. Papasouliotis, Sunnyvale, CA (US);
Raihan M. Tarafdar, San Jose, CA (US);
Adrianne K. Tipton, Pleasanton, CA (US);
Ron Rulkens, Milpitas, CA (US);
Dennis M. Hausmann, Los Gatos, CA (US);
Jeff Tobin, Mountain View, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Methods of forming conformal films with increased density are described. The methods may be used to improve gap fill in semiconductor device manufacturing by eliminating seams and voids. The methods involve operating at high reactant partial pressure. Additionally, film properties may be further enhanced by optimizing the temperature of the substrate during exposure to the metal-containing and/or silicon-containing precursor gases commonly used in conformal film deposition techniques such as ALD and PDL.