The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Nov. 27, 2002
Raashina Humayun, San Jose, CA (US);
Patrick C. Joyce, Fremont, CA (US);
Adrianne Kay Tipton, Fremont, CA (US);
Krishnan Shrinivasan, San Jose, CA (US);
Dennis W. Hess, Atlanta, GA (US);
Satyanarayana Myneni, Atlanta, GA (US);
Souvik Banerjee, Fremont, CA (US);
Raashina Humayun, San Jose, CA (US);
Patrick C. Joyce, Fremont, CA (US);
Adrianne Kay Tipton, Fremont, CA (US);
Krishnan Shrinivasan, San Jose, CA (US);
Dennis W. Hess, Atlanta, GA (US);
Satyanarayana Myneni, Atlanta, GA (US);
Souvik Banerjee, Fremont, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A method of delivering a reagent to a wafer is provided. A solvent is provided. A set of conditions of temperature and pressure is provided to the solvent, which is sufficient to bring the solvent to supercritical conditions. A reagent is provided. A surfactant is provided, where the surfactant has a first moiety with an affinity for the solvent and a second moiety with an affinity for the reagent, where the surfactant increases the concentration of the reagent that may be carried by the solvent. The solvent, surfactant, and reagent are combined to form a solution. The solution is delivered to a supercritical process chamber, wherein a wafer is exposed to the solution in the process chamber.