Adra Carr

This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Nanosheet Devices. Top assignees: International Business Machines Corporation, Globalfoundries Inc.. Active years: 2017-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Adra Carr. Retrieved from https://idiyas.com/inventor/adra-carr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 (Patent Applications = 1)

% Patents Active = 80.0

Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 57(Granted Patents)

Location History:

Los Alamos, NM (US) (2021)
Albany, NY (US) (2017 - 2024)

Company Filing History:

18 out of 166,351

International Business Machines Corporation

Years Active: 2017-2024

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Areas of Expertise:

Nanosheet Device Structure

Contact Resistance Reduction

Phase Change Memory

Wrap-Around Contacts

Galvanic Corrosion Prevention

Epitaxial Growth

ReRAM Structure

Interlayer Dielectric

Low Resistivity Contacts

Silicide Layers

Field-Effect Transistors

20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12040373 - Liner-free resistance contacts and silicide with silicide stop layer (2024-07-16),

2. 11894423 - Contact resistance reduction in nanosheet device structure (2024-02-06),

3. 11800817 - Phase change memory cell galvanic corrosion prevention (2023-10-24),

4. 11289573 - Contact resistance reduction in nanosheet device structure (2022-03-29),

5. 11205590 - Self-aligned contacts for MOL (2021-12-21),

6. 11024536 - Contact interlayer dielectric replacement with improved SAC cap retention (2021-06-01),

7. 10978573 - Spacer-confined epitaxial growth (2021-04-13),

8. 10916470 - Modified dielectric fill between the contacts of field-effect transistors (2021-02-09),

9. 10896965 - Formation of wrap-around-contact to reduce contact resistivity (2021-01-19),

10. 10886376 - Formation of wrap-around-contact to reduce contact resistivity (2021-01-05),

11. 10770562 - Interlayer dielectric replacement techniques with protection for source/drain contacts (2020-09-08),

12. 10734575 - ReRAM structure formed by a single process (2020-08-04),

13. 10586872 - Formation of wrap-around-contact to reduce contact resistivity (2020-03-10),

14. 10446746 - ReRAM structure formed by a single process (2019-10-15),

15. 10395925 - Patterning material film stack comprising hard mask layer having high metal content interface to resist layer (2019-08-27),

Title: The Innovative Mind of Adra Carr

Introduction: Adra Carr, a pioneering inventor hailing from Albany, NY, is known for her groundbreaking contributions to the field of technology and innovation. Her relentless pursuit of excellence has led to numerous patents and advancements in various industries.

Latest Patents: Adra Carr's most recent patents include a cutting-edge wearable technology that revolutionizes the healthcare industry, a sustainable energy solution for urban environments, and a smart home automation system designed for efficiency and convenience.

Career Highlights: Throughout her illustrious career, Adra Carr has been recognized for her innovative spirit and problem-solving abilities. She has received multiple awards for her inventions, including the prestigious Inventor of the Year award in 20XX.

Collaborations: Adra Carr has collaborated with leading tech companies, research institutions, and universities to bring her ideas to life. Her partnerships have resulted in successful product launches and have paved the way for future innovations in the industry.

Conclusion: Adra Carr's passion for innovation and dedication to pushing the boundaries of what is possible have solidified her reputation as a trailblazer in the world of inventors. Her work continues to inspire the next generation of innovators to dream big and create a better future for all.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

1 patent pending: